|
|
Virtual Stepper
Synopsys’ Virtual Stepper® system plays a significant role
in improving the quality of advanced masks. An integrated
software solution, Virtual Stepper determines the impact of
mask defects by separating true defects from nuisance defects.
Virtual Stepper uses the optical images generated from an
inspection tool to create a simulated image of the final wafer
pattern, and then checks mask quality and analyzes printability
of the mask defects.
Key benefits:
- Provides advanced defect print ability analysis and mask
quality control capabilities
- Can be used for through-repair and post-repair verification
- Reduces mask cost and manufacturing cycle time by
automating what has been a manual, labor-intensive step in
the manufacturing process
- Offers an accurate, uncompromising solution for making
quick decisions, reviewing and classifying defects
- Provides an efficient way to accurately classify the defects,
accelerating a product’s time to market
- Offers return-on-investment in days or weeks instead of
months or years
- Leverages Synopsys’ world-class expertise in simulation,
lithography, semiconductor processing, EDA systems,
and support
  Back to Synopsys
|
|
Sitemap 
