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Proteus
Proteus™ is a comprehensive and powerful environment for
performing full-chip proximity correction, building models for
correction, and analyzing proximity effects on corrected and
uncorrected IC layout patterns. The high level of programmability
and flexibility built into Proteus ensures an optimal
match to the designer’s processing objectives and constraints.
Proteus’ core correction processing engine, combines an
efficient hierarchy manager with proprietary, high-speed
simulation algorithms. Proteus is typically parallelized across
clusters of computers resulting in reliable, accurate full-chip
corrections and compact output files with fast turnaround time.
Progen, a revolutionary lithography model development tool,
enables users to create models of virtually any form and fit
them to empirical data. The results are compact, efficient
models used by the Proteus correction engine. Prospector,
is an interactive visualization and analysis tool through which
the interactions of models and patterns can be explored,
measured, collated, and exported for use by other tools.
Key benefits:
- Enhances yield and enables the continued evolution toward
ultradeep submicron designs by modifying layout geome
tries to improve printability
- Extensive programmability ensures that Proteus can be
adapted to accommodate virtually any type of optical
proximity effect or other distortions arising from resist, etch,
and underlying topography influences
- Supports distributed network processing for fast turnaround
time. By distributing the task among several
platforms, cycle times can be dramatically shortened
- Excellent scalability achieved on more than 1000 processors
- Offers extensive support for a variety of engineered
mask techniques
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