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CATS
CATS™ is a full solution for photomask manufacturing data
preparation. With installations in virtually every photomask
manufacturing facility worldwide, it has become the de facto
standard for preparing data for mask manufacturing. With
scalable distributed processing, an intuitive, enhanced graphics
package, proven quality, and support for every leading-edge
mask manufacturing format, CATS is a powerful and flexible
software package.
Key benefits:
- Offers the most advanced and fully featured data preparation
software available for semiconductor photomask manufacturing.
Applications include inspection, metrology, and
direct-write-on-wafer
- Most powerful and flexible software package of its kind
- Offers hierarchical processing of design data with the
utmost compatibility for each machine format
- Scalable distributed processing fractures flat optical
proximity correction (OPC) data in fast turnaround times
- Minimizes turnaround time and maximizes the quality of
today’s high-end masks
- Provides cutting-edge solutions for today’s most demanding
manufacturing challenges
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