Synopsys’ Design for Manufacturing products are
designed to accelerate time-to-yield through solutions
that bridge the worlds of design and manufacturing. The
company’s mask synthesis and lithography verification
products lead the market in speed and accuracy–
improving yields through improved lithography resolution
and lower mask costs. Synopsys’ market-leading CATS™
mask data preparation tool has been proven in virtually
every fab and mask shop worldwide and has been
enhanced with graphics and distributed processing to
handle advanced masks quickly. Synopsys’ technology
computer-aided design (TCAD) products are used by
process integration teams to determine yield strategies
for sub-90-nanometer processes. Synopsys’ Virtual
Stepper product assists in determining yield of advanced
photomasks before they get to the process line. Combined
with its leadership in traditional IC design–Synopsys is
prepared to enable yields at 65-nm and beyond.
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